Quorum technologies has been the market and technology leader in electron microscopy coating and cryogenic preparation since 2001. The market-leading Q Series of vacuum coating systems and PP3010T cryo preparation systems for SEM and FIB/SEM – both true ground-up redesigns that have truly set the standard within the specimen preparation field.
Quorum make a range of critical point dryers to meet the needs of electron microscopy (EM) and other applications.
Critical point drying (sometimes called supercritical drying) is an established method of dehydrating biological tissue prior to examination in a scanning electron microscope (SEM). The technique was first introduced for SEM specimen preparation by Polaron (the forerunner of Quorum) in 1971, and the original design concepts, which included a horizontal chamber, are still embodied in the Quorum E3100 critical point dryer.
A more recent addition to our product range is the K850 critical point dryer with vertical chamber and built-in heating and cooling. The larger K850WM model is designed for semiconductor applications and will dry a 6″ wafer.
The E3100 large chamber critical point dryer has been an industry standard for over 35 years and is used in numerous scanning electron microscopy (SEM) laboratories around the world. Primarily used for critical drying of biological and geological specimens, the E3100 can also used for the controlled drying MEMs, aerogels and hydrogels.
Key features
Proven reliability – over 6,000 critical point dryer installations world-wide
Simple robust construction – easy to maintain – many critical point dryer users carry out their own routine maintenance
Horizontal chamber and large viewing window – excellent visibility of the fluid level and drying process
Safety – the design has been independently type tested to proof pressures in excess of the working pressure and bursting disc rupture pressure
Specimen handling – optional specimen holders for coverslips and TEM grids. Porous pots are available for fragile or very small specimens
The K850 combines versatility and ease of operation. Built-in thermo-electric heating and adiabatic cooling allow precise temperature control. The vertical pressure chamber (32 mm diameter x 47 mm) has a side viewing port, which gives a clear view of the liquid meniscus during filling. A magnetic stirrer ensures optimal mixing and exchange of process fluids.
Key features
Vertical chamber with top filling and bottom draining
Side viewing port – good visibility
Built-in adiabatic cooling and thermoelectric heating – accurate temperature control
Fine-control needle valve pressure let down – precise control of decompression avoids potential damage to specimens by uncontrolled pressure release
Built-in magnetic stirrer- enhanced solvent exchange
Pressure monitoring with safety cut-out for over pressure
The K850WM is a compact, bench-top instrument designed to critical point dry a complete 6″/150 mm wafer. A convenient wafer holder allows rapid transfer and ensures that pre-drying does not occur.
Key features
170 mm diameter chamber – optimised for wafer/MEMS drying
Vertical chamber with top-loading and bottom draining – ensures specimens do not become uncovered during drying
Thermoelectric heating – accurate temperature control
Fine control needle valve pressure let down – precise control
Temperature monitoring and control with thermal cut-out protection
Pressure monitoring with safety cut-out for over pressure