Tokuyama
TOKUSO IPA SE is isopropyl alcohol (IPA) made for the electronics industry. Tokuyama produces IPA SE by the original direct hydrogen method to achieve a high purity level of over 99.99%. The product is suitable for cleaning and drying process of electronic devices including semiconductors and glass substrates.
Tokuyama’s positive-type photoresist developer SD Series are chemical agents used in photolithography processes to form circuits in semiconductor wafers. They are suitable for micro-processing because that can be used to create sharp wiring patterns. Because SD Series are organic alkaline solution, they can also be used as substitutes for inorganic alkaline developer.
High-Purity Chemicals and Lithography Developer
TOKUSO IPA SE
Main applications: Precision cleaning and drying of semiconductor wafers and other electronic devices
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TOKUSO IPA SE
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Positive-Type Photoresist Developer
Main applications: Various kinds of resist developers; alkali solvents for electronic devices and other items
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