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Formulated electronic wet chemicals refers to formulated wet electronic chemicals that achieve special functions through formulation technology and meet specific requirements of chip manufacturing processes. Anji offers a series of products, such as post etch cleaning solutions, photo resist stripper, post CMP cleaning solutions, etchants, and ECD solution and additives. Post etch cleaning solutions, photoresist strippers, and post polishing cleaning solutions have been widely used in the IC manufacturing processes on 8-inch and 12-inch wafers.
Post etch cleaning solutions for aluminum post etch processes
With a safe supply solution from hydroxylamine suppliers, Anji offers semi-aqueous aluminum post-etch cleaning solutions and amine-based aluminum post-etch cleaning solutions.
These products are used for the removal of post etch residues in the aluminum process of integrated circuits, providing excellent removal capability and low cost. The products have been mass produced for both 8 - and 12-inch logic and memory chips.
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Chemical mechanical polishing is essential for achieving global and local planarization of wafers in the IC manufacturing process, in which Chemical mechanical polishing (CMP) slurries are the main processing chemicals used. Depending on the objects of polishing, Anji’s chemical mechanical polishing slurries include copper slurries, barrier slurries, dielectric (silica-based and ceria-based abrasive) slurries, tungsten slurries, slurries for various substrates, formulated wet chemicals, and polishing slurries for new materials and applications. Currently, Anji’s copper and barrier slurries can meet the needs of chip manufacturers in China and has penetrated overseas markets. Other related polishing slurries are supplied to numerous chip manufacturers in China and abroad, and their production scale will be adapted to the needs of clients.
Copper slurries and barrier slurries
We at Ellipsiz DSS offer Copper slurries and barrier slurries used for the removal and planarization of copper and copper barrier layers in the integrated circuit manufacturing processes. Products have been used in mass production of logic chips . Development and validation of products continue for future technology nodes.
Tokuyama's positive-type photoresist developer "SD Series" are chemical agents used in photolithography processes (development) to form circuits in semiconductor wafers. The SD series is comprised of high-purity products with very few impurities such as metal ions and chlorine ions. These series are suitable for micro-processing because they can be used to create sharp circuit patterns.
Because the "SD Series" are a strong organic alkaline solution, they can also be used as substitutes for an inorganic alkaline solution.
Tokuyama has shipping bases in Japan, Taiwan, Singapore, and China, and is strengthening its supply system to state-of-the-art semiconductor manufacturers.
Overview
- Generic names: Positive-type photoresist developer, Tetramethylammonium hydroxide (TMAH)
- Chemical formula: N(CH3)4OH
- Packing / shipping method: Canisters, chemical drums, polyethylene cans
- Grades
- SD-1: Surfactant is added (2.38%)
- SD-20: Conc. product (20%)
- SD-25: Conc. product (25%)
- Special developer: Special concentrations other than standard type (2.38%)
- General applications
- Photolithography process of various kinds of positive type photoresist (Photolithography process, see the illustration below.)
- Alkaline cleansers for electronic devices and other items
- Silicon etching agents for micro-electro-mechanical systems (MEMS)
- Materials for chemical-mechanical polishing (CMP) slurry
- Caution: Classified as a strong alkali substance with corrosive properties.
Special Characteristics
- High purity. Extremely low amount of impurities such as metal ions and chlorine ions.
- Applicable to micro-processing. Sharp wiring patterns for easy etching
- Strong alkali. Colorless and transparent liquid (at room temperature)
TOKUSOH IPA is a high-quality isopropyl alcohol produced through Tokuyama's proprietary direct hydration technique. Owing to its ability to be blended with both water and oil, TOKUSOH IPA is widely used in paint and ink solvents and as a compound material for medical and agricultural chemicals.
For cleaning of electronic materials, Tokuyama offers IPA SE, a purer grade of isopropyl alcohol.
Overview
- Generic names: Isopropyl Alcohol (IPA), 2-propanol
- Chemical formula: CH3CH(OH)CH3
- Packing /shipping method: Tank lorry, 160-kilogram drums and 14-kilogram cubic cans
- General applications
- Paint and ink solvents
- Material for organic synthetic compounds
- Cleaning of electronic materials
Special Characteristics
- Colorless liquid
- Similar odor to alcohol
- Highly flammable
- Water-soluble, and has properties similar to both water and organic substances
Since 1933, when MGC succeeded in the first commercial production of Hydrogen peroxide in Japan, they have maintained its status as one of the most prominent Hydrogen peroxide manufacturers in the world. From the infancy of the semiconductor industry, they have engaged in the development of Hydrogen peroxide meeting the electrical chemical specifications required. Years of intensive researched aimed at the improvement of quality have resulted in the commercialization of Super-pure hydrogen peroxide, applicable to the fabrication of devices with a high integration density.
This product is widely used, not only as a cleaning agent, etchant, and polishing agent for the wafer-preparation process, but also as a cleaning agent, photoresistance inhibitor, and etchant, for device-fabrication processes.
Features
- Plant: Yamakita, Saga
- Main Applications: Electronics industry cleaning agent, etching agent, resist stripping agent
Super-Pure Aqueous Ammonia is one of the many downstream products derived from the Ammonia manufacturing process.
In the same manner as Super-pure hydrogen peroxide, this product is used as a cleaning agent and etchant in the semiconductor industry.
Features
- Plant: Niigata
- Main Applications: Electronics industry cleaning agent, etching agent
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