Positive-Type Photoresist Developer

Tokuyama's positive-type photoresist developer "SD Series" are chemical agents used in photolithography processes (development) to form circuits in semiconductor wafers. The SD series is comprised of high-purity products with very few impurities such as metal ions and chlorine ions. These series are suitable for micro-processing because they can be used to create sharp circuit patterns.

Because the "SD Series" are a strong organic alkaline solution, they can also be used as substitutes for an inorganic alkaline solution.

Tokuyama has shipping bases in Japan, Taiwan, Singapore, and China, and is strengthening its supply system to state-of-the-art semiconductor manufacturers.


  • Generic names: Positive-type photoresist developer, Tetramethylammonium hydroxide (TMAH)
  • Chemical formula: N(CH3)4OH
  • Packing / shipping method: Canisters, chemical drums, polyethylene cans
  • Grades

    • SD-1: Surfactant is added (2.38%)
    • SD-20: Conc. product (20%)
    • SD-25: Conc. product (25%)
    • Special developer: Special concentrations other than standard type (2.38%)

  • General applications

    • Photolithography process of various kinds of positive type photoresist (Photolithography process, see the illustration below.)
    • Alkaline cleansers for electronic devices and other items
    • Silicon etching agents for micro-electro-mechanical systems (MEMS)
    • Materials for chemical-mechanical polishing (CMP) slurry

  • Caution: Classified as a strong alkali substance with corrosive properties.

Special Characteristics

  • High purity. Extremely low amount of impurities such as metal ions and chlorine ions.
  • Applicable to micro-processing. Sharp wiring patterns for easy etching
  • Strong alkali. Colorless and transparent liquid (at room temperature)

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